Radial Line Slot Antenna Plasma
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*Radial Line Slot Antenna Plasma Cutter
*Radial Line Slot Antenna Plasma Tv
The radial line slot antenna plasma source is a high-density microwave plasma source comprising a high electron temperature source region within the plasma skin depth from a coupling window and low electron temperature diffusion region far from the window. A radial line slot antenna (RLSA) 400 mm in diameter is designed for a plasma source at 8.3 GHz as a candidate for a large area high density plasma source with a narrow process space.Radial Line Slot Antenna Plasma Cutter Large-area plasma excitation in densely arrayed radial line slot antennas using TE11 rotating mode Abstract
A novel feeding structure using a TE11 (transverse electric) rotating mode in a radial line slot antenna for plasma production is proposed. Moreover, novel slot patterns with different coupling slot distributions are fabricated and tested. Extremely uniform plasma over a large diameter is observed and the possibility of control of the plasma distribution in the radial direction by changing to different coupling slot distributions is verified.
Publication:Pub Date:June 2004DOI:10.1139/p04-019Bibcode: 2004CaJPh..82..489Y Simulations of the Plasma Structure of a Radial Line Slotted Antenna Plasma Source Radial Line Slot Antenna Plasma TvAbstract
The Radial Line Slot Antenna (RLSA) plasma source couples microwave power through a slot antenna structure and window to a plasma characterized by a generation zone adjacent to the window and a diffusion zone that contacts a substrate. The diffusion zone is characterized by a very low electron temperature. This property renders the source useful for soft etch applications and thin film processing for which low ion energy is desirable. Another property of the diffusion zone is that the plasma density falls from the axis to the walls. Static magnetic fields at the walls of other plasma sources have been shown to impede electron losses to walls lowering their loss rate and changing the plasma profile. In this presentation, the impact of different magnetic field configurations on the diffusion zone plasma structure will be described. To do this, an ambipolar-electromagnetic field model previously used to describe RLSA plasmas is modified to account for the impact of magnetic fields on transport coefficients and plasma chemistry. Resonant and other effects of magnetic field are also discussed.
Publication:Pub Date:October 2011Bibcode: 2011APS..GECQR1093Y
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*Radial Line Slot Antenna Plasma Cutter
*Radial Line Slot Antenna Plasma Tv
The radial line slot antenna plasma source is a high-density microwave plasma source comprising a high electron temperature source region within the plasma skin depth from a coupling window and low electron temperature diffusion region far from the window. A radial line slot antenna (RLSA) 400 mm in diameter is designed for a plasma source at 8.3 GHz as a candidate for a large area high density plasma source with a narrow process space.Radial Line Slot Antenna Plasma Cutter Large-area plasma excitation in densely arrayed radial line slot antennas using TE11 rotating mode Abstract
A novel feeding structure using a TE11 (transverse electric) rotating mode in a radial line slot antenna for plasma production is proposed. Moreover, novel slot patterns with different coupling slot distributions are fabricated and tested. Extremely uniform plasma over a large diameter is observed and the possibility of control of the plasma distribution in the radial direction by changing to different coupling slot distributions is verified.
Publication:Pub Date:June 2004DOI:10.1139/p04-019Bibcode: 2004CaJPh..82..489Y Simulations of the Plasma Structure of a Radial Line Slotted Antenna Plasma Source Radial Line Slot Antenna Plasma TvAbstract
The Radial Line Slot Antenna (RLSA) plasma source couples microwave power through a slot antenna structure and window to a plasma characterized by a generation zone adjacent to the window and a diffusion zone that contacts a substrate. The diffusion zone is characterized by a very low electron temperature. This property renders the source useful for soft etch applications and thin film processing for which low ion energy is desirable. Another property of the diffusion zone is that the plasma density falls from the axis to the walls. Static magnetic fields at the walls of other plasma sources have been shown to impede electron losses to walls lowering their loss rate and changing the plasma profile. In this presentation, the impact of different magnetic field configurations on the diffusion zone plasma structure will be described. To do this, an ambipolar-electromagnetic field model previously used to describe RLSA plasmas is modified to account for the impact of magnetic fields on transport coefficients and plasma chemistry. Resonant and other effects of magnetic field are also discussed.
Publication:Pub Date:October 2011Bibcode: 2011APS..GECQR1093Y
Register here: http://gg.gg/nxyyf
https://diarynote-jp.indered.space
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